| Nom De Marque: | ZMSH |
| MOQ: | 10 |
| Délai De Livraison: | 2-4 semaines |
| Conditions De Paiement: | T/T |
Lithium Tantalate on Insulator (LTOI) wafers are engineered piezoelectric thin-film substrates developed for next-generation acoustic wave devices, particularly Temperature-Compensated Surface Acoustic Wave (TC-SAW) filters used in modern RF front-end modules.
The LTOI structure combines a thin single-crystal lithium tantalate (LiTaO₃) layer with an insulating oxide layer and a silicon support substrate. This advanced architecture enables superior acoustic wave confinement, lower insertion loss, enhanced temperature stability, and improved high-frequency performance compared with conventional bulk lithium tantalate wafers.
LTOI technology has become a key material platform for RF filters used in smartphones, wireless communication infrastructure, IoT devices, and emerging 5G/6G communication systems.
An LTOI wafer is a bonded piezoelectric substrate consisting of three functional layers:
The active piezoelectric layer responsible for generating and propagating surface acoustic waves.
Acts as an acoustic isolation layer that suppresses energy leakage while providing electrical insulation.
Provides mechanical support, improved wafer handling, and compatibility with semiconductor manufacturing processes.
This multilayer structure allows acoustic energy to remain concentrated within the active piezoelectric layer, significantly improving filter efficiency and device performance.
LTOI wafers are typically fabricated using advanced ion-slicing and wafer bonding technologies.
Hydrogen or helium ions are implanted into a high-quality lithium tantalate crystal at a controlled depth to create a predefined cleavage layer.
The implanted lithium tantalate wafer is bonded to a silicon substrate through a thermally grown or deposited SiO₂ layer.
Controlled annealing strengthens the bonding interface and initiates layer splitting along the implanted plane.
The transferred lithium tantalate film is precisely polished to achieve excellent thickness uniformity and ultra-low surface roughness.
This process enables wafer-scale production of high-quality piezoelectric thin films suitable for advanced RF devices.
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LTOI significantly reduces frequency drift caused by environmental temperature changes, making it the preferred substrate for TC-SAW filters.
Lithium tantalate exhibits strong piezoelectric characteristics, enabling efficient conversion between electrical and acoustic signals.
The thin-film architecture supports higher operating frequencies than conventional bulk lithium tantalate substrates, making it suitable for advanced RF bands.
The buried oxide layer minimizes acoustic energy leakage into the substrate, improving filter selectivity, quality factor (Q), and insertion loss performance.
LTOI wafers can be integrated into wafer-level fabrication processes, enabling scalable and cost-effective mass production.
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| Parameter | Typical Range |
|---|---|
| Material | Lithium Tantalate on Insulator (LTOI) |
| LT Crystal Orientation | Customized |
| LT Film Thickness | Customized |
| Buried Oxide Layer | SiO₂ |
| Handle Wafer | Silicon |
| Wafer Diameter | 4", 6", 8" |
| Surface Finish | DSP / SSP |
| Surface Roughness | Customizable |
| Thickness Uniformity | Customizable |
| Feature | Bulk LiTaO₃ | LTOI |
|---|---|---|
| Temperature Stability | Moderate | Excellent |
| Acoustic Confinement | Limited | Superior |
| High-Frequency Capability | Good | Excellent |
| Filter Performance | Standard | Enhanced |
| Wafer-Level Integration | Limited | Excellent |
| RF Front-End Suitability | Good | Preferred |
LTOI technology provides a more advanced platform for manufacturing compact, high-performance RF filters required by modern wireless communication systems.
LTOI wafers are primarily used for TC-SAW and SAW filters in RF front-end modules for smartphones, wireless communication equipment, and high-frequency electronic systems.
The thin-film structure offers superior acoustic confinement, lower insertion loss, and improved temperature stability, which are critical requirements for modern 5G communication bands.
Yes. Film thickness, crystal orientation, oxide layer thickness, wafer diameter, and surface specifications can all be customized according to device design requirements.
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